Matou te tuʻuina atu i tagata faʻatau fesoʻotaʻiga / semiconductor faʻatasi ai ma kesi faʻapitoa e manaʻomia mo gaioiga e pei o le faʻasalalau, lithography, deposition, etching, doping, ma le faʻamamaina.
O le tali fa'ama'i i le va o le kasa eletonika ma le mea e togitogia e mana'omia i le fa'agasologa o fale gaosi oloa. I le faagasologa o le etching o wafer gaosiga, e tatau ona faaaoga se kasa electron-faapitoa e aveese le vaega etched e ausia ai le faamoemoega o le etching faasinomaga.
I totonu o le semiconductor alamanuia, silane e masani ona faʻaaogaina e gaosia ai polysilicon maualuga-mama, silicon dioxide film, silicon nitride film, polysilicon isolation layer, ma isi mea, ma e mafai foi ona faʻaaogaina e gaosia ai sela la, filo opitika ma masini photoelectric, ma isi.
I le avea ai o se kasa eletise, o le nitrous oxide e masani ona faʻaaogaina i le dielectric thin film process mo le atinaʻeina ma le gaosiga o masini optoelectronic semiconductor. O se kesi manatu autu e le mafai ona suia e afaina tonu ai le lelei o masini optoelectronic.